HORTICULTURE SCIENCE
APPLICATION OF NANO TECHNOLOGY
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Question
[CLICK ON ANY CHOICE TO KNOW THE RIGHT ANSWER]
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Photoresist is used temporarily in this process.
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It uses electron beam to create patterns on the substrate.
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It is a non-contact, automated process and involved minimal solvents in this process.
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Softbake is used to remove solvent from photoresist and activates photoactive compound
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Negative photoresist is cheap and provide good pattern resolution.
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Detailed explanation-1: -The first photoresist bake is called soft bake; it’s done just after the spin coating of the SU-8 photoresist. Its aim is to evaporate the solvent to make the SU-8 photoresist more solid. The evaporation will change a little bit the thickness of the layer and prepare the SU-8 photoresist to be exposed to the UV.
Detailed explanation-2: -Soft-baking is the step during which almost all of the solvents are removed from the photoresist coating. Soft-baking plays a very critical role in photo-imaging.
Detailed explanation-3: -NMP (1-methyl-2-pyrrolidone) is a generally suitable solvent for removing photoresist layers. The very low vapour pressure of NMP allow heating to 80°C in order to be able to remove even more cross-linked pho-toresist films.
Detailed explanation-4: -Which of the following BEST describes the photolithography process? a. The process step that transfers a pattern using UV light into an underlying layer or the substrate’s bulk.